If you are looking for high-quality products, please feel free to contact us and send an inquiry, email: brad@ihpa.net
Magnesium is a light, silvery-white and fairly tough metal. It tarnishes slightly in air and is highly reactive with water, but is otherwise quite stable. It is used in strong and lightweight aluminum-magnesium alloys, primarily in aircraft and automobile production. It is also the basis for many medical-grade metallic compounds such as magnesium stearate, thorium dioxide and zirconium oxide.
Sputtering is a thin-film technology that produces coatings and films by creating a sub-atmospheric pressure environment and bombarding it with atomic or molecular vapor sources. The vapors, or atoms, are emitted from the surface of a target (such as a sputtering target), and are deposited onto a substrate to form a film. The substrate can be a silicon wafer, glass or another material such as copper.
HM offers an extensive range of standard sputter targets in both monoblock and bonded configurations. These targets can be supplied in a variety of sizes, flatness and purity levels to meet your specific requirements. Special sputter targets can be produced upon request to suit specific applications such as high resolution sample coating for FESEM.
Magnesium fluoride (MgF2) is a high-performance sputtering target for anti-reflection coatings on glass. It is a non-oxidising material with very fine grain size, making it an excellent substitute for Chromium in high-resolution coating applications. Suitable for both DC and RF sputter coating equipment, it is well-suited to applications that require a higher SE yield than traditional Pt/Pd targets. Please contact us if you have any specific requirements for your magnetron sputtering target.